@article{,
    author = {Maier-Komor, Paul; Bergmaier, Andreas; Dollinger, Günther; Friese, J.; Karsch, Stefan; Kienle, P.; Körner, Hans-Joachim},
    title = {An UHV box coater for VUV reflective coatings on mirror substrates of up to 95 cm in diameter},
    editor = {},
    booktitle = {},
    series = {},
    journal = {Nuclear Instruments and Methods in Physics Research Section A},
    address = {},
    publisher = {},
    edition = {},
    year = {1997},
    isbn = {},
    volume = {397},
    number =  {1},
    pages = {194-199},
    url = {http://www.sciencedirect.com/science/article/pii/S0168900297007614?via},
    doi = {10.1016/S0168-9002(97)00761-4},
    keywords = {Aluminum ; Condensation ; Electron beams ; Evaporation ; Light reflection ; Metallic films ; Mirrors ; Photocathodes ; Protective coatings ; Radiation detectors ; Targets ; Ultraviolet radiation, Elastic recoil detection analysis ; Electron bombardment evaporation, Optical coatings},
    abstract = {Large mirrors with excellent reflectivity in the vacuum ultraviolet (VUV) range down to 140 nm are needed for large area RICH detectors with CsI photocathodes. This demand can only be fulfilled with a thin homogenous aluminium layer on a substrate with very low surface roughness. Due to the base metal properties of Al an excellent vacuum is required during the evaporation-condensation process. In addition the Al film needs suitable protective layers on both surfaces. The setup of pilot plants to investigate deposition parameters are described and the design of an appropriate box coater is presented.},
    note = {},
    institution = {Universität der Bundeswehr München, Fakultät für Luft- und Raumfahrttechnik, LRT 2 - Institut für angewandte Physik und Messtechnik, Professur: Dollinger, Günther},
    
    
}