@article{,
    author = {Sauter, Martin; Bertagnolli, Emmerich; Knapek, Erwin; Stemmer, Andreas; Fröschle, Barbara; Eisele, Ignaz; Klose, Helmut},
    title = {Application of electron beam lithography for downscaling of SOI-Bipolar and BiCMOS},
    editor = {},
    booktitle = {Micro- and Nano-Engineering 95},
    series = {},
    journal = {Microeletronic Engineering},
    address = {},
    publisher = {},
    edition = {},
    year = {1996},
    isbn = {},
    volume = {30},
    number =  {1-4},
    pages = {31-34},
    url = {https://doi.org/10.1016/0167-9317(95)00188-3},
    doi = {10.1016/0167-9317(95)00188-3},
    keywords = {},
    abstract = {},
    note = {},
    institution = {Universität der Bundeswehr München, Fakultät für Elektrotechnik und Technische Informatik, ETTI 1 - Institut für Physik, Elektrotechnik und Automatisierungstechnik, Professur: Sauter, Martin},
    
    
}