@article{,
    author = {Maguire, Pierce; Jadwiszczak, Jakub; O´Brien, Maria; Keane, Darragh; Duesberg, Georg S.; McEvoy, Niall; Zhang, Hongzhou},
    title = {Defect-moderated oxidative etching of MoS<sub>2</sub>},
    editor = {},
    booktitle = {},
    series = {},
    journal = {Journal of Applied Physics},
    address = {},
    publisher = {},
    edition = {},
    year = {2019},
    isbn = {},
    volume = {126},
    number =  {16},
    pages = {},
    url = {https://doi.org/10.1063/1.5115036},
    doi = {10.1063/1.5115036},
    keywords = {},
    abstract = {},
    note = {},
    institution = {Universität der Bundeswehr München, Fakultät für Elektrotechnik und Informationstechnik, EIT 2 - Institut für Physik, Professur: Düsberg, Georg},
    
    
}