@article{,
    author = {Chen, Xin; Kohring, Malte; Assebban, M'hamed; Tywoniuk, Bartlomiej; Bartlam, Cian; Badlyan, Narine Moses; Maultzsch, Janina; Düsberg, Georg; Weber, Heiko B.; Knirsch, Kathrin C.; Hirsch, Andreas},
    title = {Covalent Patterning of 2D MoS<sub>2</sub>},
    editor = {},
    booktitle = {},
    series = {},
    journal = {Chemistry - a European journal},
    address = {},
    publisher = {},
    edition = {},
    year = {2021},
    isbn = {},
    volume = {27},
    number =  {52},
    pages = {13117-13122},
    url = {https://doi.org/10.1002/chem.202102021},
    doi = {10.1002/chem.202102021},
    keywords = {},
    abstract = {The development of an efficient method to patterning 2D MoS<sub>2</sub> into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionalization. This strategy allows us to generate delicate MoS<sub>2</sub> ribbon patterns with a minimum feature size of 2 μm in a high throughput rate. The patterned monolayer MoS<sub>2</sub> domain consists of a spatially well-defined heterophase homojunction and alternately distributed surface characteristics, which holds great interest for further exploration of MoS<sub>2</sub> based devices.},
    note = {},
    institution = {Universität der Bundeswehr München, Fakultät für Elektrotechnik und Informationstechnik, EIT 2 - Institut für Physik, Professur: Düsberg, Georg},
    
    
}